Cvetanović Zobenica, Katarina, Department of Microelectronic Technologies, Institute of Chemistry, Technology and Metallurgy, National Institute of the Republic of Serbia, University of Belgrade, Njegoševa 12, 11000 Belgrade, Serbia, Srbija
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HEMIJSKA INDUSTRIJA : : ХЕМИЈСКА ИНДУСТРИЈА God. 75 Br. 1 (2021) - Hemijsko inženjerstvo - Simulacija i optimizacija
Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH
Apstrakt PDF (888 kB) (English) Untitled (English) Untitled (English) Untitled (English) Untitled (English) Untitled (English) Response to reviewers (English) New figure 1 (English) New figure 2 (English) New figure 3 (English) New figure 4 (English) New figure 5 (English) New figure 6 (English) Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt % TMAH (English)